Research Associate EUV Thin Film Metrology | Wissenschaftlicher Mitarbeiter EUV-Schichtmesstechnik

Job Summary

This role involves developing high-precision measurement techniques for qualifying optical thin films on EUV mirrors using large-scale metrology systems. The successful candidate will define requirements for subsystems, implement new solutions in measurement processes and algorithms, and serve as a key contact for EUV radiation generation, troubleshooting commissioning and operation of EUV sources. The position requires verifying concepts through experiments and extensive data analysis, demonstrating measurement capabilities, and supporting production with complex issues. This is an attractive opportunity for a highly analytical individual with a strong background in physics and optical metrology to contribute to cutting-edge EUV technology.